The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2014

Filed:

Dec. 15, 2010
Applicants:

Mary Kathryn Haas, Emmaus, PA (US);

Raymond Nicholas Vrtis, Orefield, PA (US);

Laura M. Matz, Allentown, PA (US);

Inventors:

Mary Kathryn Haas, Emmaus, PA (US);

Raymond Nicholas Vrtis, Orefield, PA (US);

Laura M. Matz, Allentown, PA (US);

Assignee:

Air Products and Chemicals, Inc., Allentown, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

A deposition for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including one precursor of an organosilane or an organosiloxane, and a porogen distinct from the precursor, wherein the porogen is aromatic in nature; applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents to deposit a film, containing the porogen; and removing substantially all of the organic material by UV radiation to provide the porous film with pores and a dielectric constant less than 2.6.


Find Patent Forward Citations

Haas, Mary. (2014). Low k precursors providing superior integration attributes (U.S. Patent No. 8753986). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8753986

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…