The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2013

Filed:

Jun. 03, 2010
Applicants:

Laura M. Matz, Allentown, PA (US);

Xiangxin Rui, San Jose, CA (US);

Xinjian Lei, Vista, CA (US);

Sunil Shanker, Santa Clara, CA (US);

Moo-sung Kim, Seongnam, KR;

Iain Buchanan, Cambusbarron, GB;

Inventors:

Laura M. Matz, Allentown, PA (US);

Xiangxin Rui, San Jose, CA (US);

Xinjian Lei, Vista, CA (US);

Sunil Shanker, Santa Clara, CA (US);

Moo-Sung Kim, Seongnam, KR;

Iain Buchanan, Cambusbarron, GB;

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); B32B 19/00 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the current invention include methods of forming a strontium titanate (SrTiO) film using atomic layer deposition (ALD). More particularly, the method includes forming a plurality of titanium oxide (TiO) unit films using ALD and forming a plurality of strontium oxide (SrO) unit films using ALD. The combined thickness of the TiOand SrO unit films is less than approximately 5 angstroms. The TiOand SrO units films are then annealed to form a strontium titanate layer.


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