The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Nov. 23, 2009
Laura M. Matz, Allentown, PA (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'neill, San Marcos, CA (US);
Dino Sinatore, Whitehall, PA (US);
Laura M. Matz, Allentown, PA (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'Neill, San Marcos, CA (US);
Dino Sinatore, Whitehall, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method is provided for depositing a dielectric barrier film including a precursor with silicon, carbon, oxygen, and hydrogen with improved barrier dielectric properties including lower dielectric constant and superior electrical properties. This method will be important for barrier layers used in a damascene or dual damascene integration for interconnect structures or in other dielectric barrier applications. In this example, specific structural properties are noted that improve the barrier performance.