The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Dec. 02, 2009
Xinjian Lei, Vista, CA (US);
Daniel P. Spence, Carlsbad, CA (US);
Moo-sung Kim, Sungnam, KR;
Iain Buchanan, Stirling, GB;
Laura M. Matz, Allentown, PA (US);
Sergei Vladimirovich Ivanov, Schnecksville, PA (US);
Xinjian Lei, Vista, CA (US);
Daniel P. Spence, Carlsbad, CA (US);
Moo-Sung Kim, Sungnam, KR;
Iain Buchanan, Stirling, GB;
Laura M. Matz, Allentown, PA (US);
Sergei Vladimirovich Ivanov, Schnecksville, PA (US);
Air Product and Chemicals, Inc., Allentown, PA (US);
Abstract
Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M comprises a metal chosen from Ti, Zr, and Hf; R and Rare each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; Ris an alkyl group comprising from 1 to 10 carbon atoms; Ris chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms; Ris an alkyl group comprising from 1 to 6 carbon atoms and wherein Rand Rare different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors.