IDiyas

For the Inventor, By the Inventor

Seoul, South Korea

Kwang-sub Yoon

USPTO Granted Patents = 20


Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 64(Granted Patents)


Location History:

  • Seoul, KR (2003 - 2011)
  • Yongin-si, KR (2008 - 2018)

Company Filing History:

goldMedal20 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2003-2018

Loading Chart...
Loading Chart...
20 patents (USPTO):
1. 9927720 - Substrate target for in-situ lithography metrology, metrology method for in-situ lithography, and method of manufacturing integrated circuit device by using in-situ metrology (2018-03-27),
2. 9557655 - Photomask including focus metrology mark, substrate target including focus monitor pattern, metrology method for lithography process, and method of manufacturing integrated circuit device (2017-01-31),
3. 9373698 - Methods of manufacturing semiconductor devices and electronic devices (2016-06-21),
4. 9312188 - Method for fabricating semiconductor device (2016-04-12),
5. 9123655 - Methods of forming layer patterns of a semiconductor device (2015-09-01),
6. 8263487 - Method of forming patterns of semiconductor device (2012-09-11),
7. 7863231 - Thinner composition and method of removing photoresist using the same (2011-01-04),
8. 7457058 - Optical element holder and projection exposure apparatus having the same (2008-11-25),
9. 7449383 - Method of manufacturing a capacitor and method of manufacturing a dynamic random access memory device using the same (2008-11-11),
10. 7387988 - Thinner composition and method of removing photoresist using the same (2008-06-17),
11. 7241552 - Resist composition comprising photosensitive polymer having lactone in its backbone (2007-07-10),
12. 7202011 - Photosensitive polymer including fluorine and resist composition containing the same (2007-04-10),
13. 7045267 - Resist composition comprising photosensitive polymer having lactone in its backbone (2006-05-16),
14. 6933096 - Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition (2005-08-23),
15. 6844134 - Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same (2005-01-18),

Title: Innovations and Contributions of Kwang-sub Yoon

Introduction

Kwang-sub Yoon is an accomplished inventor based in Seoul, South Korea, known for his significant contributions to the field of metrology in lithography processes. With an impressive portfolio of 20 patents, Yoon has demonstrated his expertise in developing technologies that enhance the precision of integrated circuit manufacturing.

Latest Patents

Among his latest patents are innovative solutions such as the "Substrate Target for In-Situ Lithography Metrology," "Metrology Method for In-Situ Lithography," and "Method of Manufacturing Integrated Circuit Device by Using In-Situ Metrology." These inventions introduce a substrate capable of integrating feature patterns and a metrology pattern designed for precise measurement in lithography processes. Additionally, his photomask technologies include a focus metrology mark that allows for accurate measurement of focal variations in feature patterns on substrates.

Career Highlights

Kwang-sub Yoon is a key member of Samsung Electronics Co., Ltd., where he has played a pivotal role in advancing lithography metrology techniques. His innovative approaches aim to enhance the efficiency of integrated circuit device manufacturing. Yoon's dedication to pushing the boundaries of technology has garnered recognition within the industry as he actively contributes to the evolution of semiconductor manufacturing processes.

Collaborations

Throughout his career, Yoon has collaborated with talented colleagues, including Sang-jun Choi and Sang-gyun Woo. These collaborations have fostered an environment of innovation and advancement in metrology methods, facilitating the successful development of cutting-edge technologies within the field.

Conclusion

Kwang-sub Yoon’s work exemplifies the impact of innovative thinking in the semiconductor industry. With his patented technologies and collaborative efforts, Yoon continues to pave the way for advancements in integrated circuit manufacturing, solidifying his reputation as a leading inventor in his field. His contributions not only reflect his dedication to excellence but also the future of technology in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…