The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2005

Filed:

Nov. 05, 2002
Applicants:

Sang-jun Choi, Seoul, KR;

Joo-tae Moon, Kyungki-do, KR;

Sang-gyun Woo, Kyungki-do, KR;

Kwang-sub Yoon, Seoul, KR;

Ki-yong Song, Seoul, KR;

Inventors:

Sang-Jun Choi, Seoul, KR;

Joo-Tae Moon, Kyungki-do, KR;

Sang-Gyun Woo, Kyungki-do, KR;

Kwang-Sub Yoon, Seoul, KR;

Ki-Yong Song, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7004 ; C08F21418 ;
U.S. Cl.
CPC ...
Abstract

A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows:


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