The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Aug. 03, 2004
Kwang-sub Yoon, Seoul, KR;
Dong-won Jung, Yongin, KR;
Si-hyeung Lee, Suwon, KR;
Hyun-woo Kim, Sungnam, KR;
Sook Lee, Seoul, KR;
Sang-gyun Woo, Suwon, KR;
Sang-jun Choi, Seoul, KR;
Kwang-sub Yoon, Seoul, KR;
Dong-won Jung, Yongin, KR;
Si-hyeung Lee, Suwon, KR;
Hyun-woo Kim, Sungnam, KR;
Sook Lee, Seoul, KR;
Sang-gyun Woo, Suwon, KR;
Sang-jun Choi, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile