IDiyas

For the Inventor, By the Inventor

San Jose, CA, United States of America

Kenny Linh Doan

USPTO Granted Patents = 20 

Average Co-Inventor Count = 5.5

ph-index = 9

Forward Citations = 1,192(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2019)
  • San Jose, CA (US) (2001 - 2021)

Company Filing History:

goldMedal19 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 2001-2021

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20 patents (USPTO):
1. 10930540 - Electrostatic chuck assembly having a dielectric filler (2021-02-23),
2. 10546731 - Method, apparatus and system for wafer dechucking using dynamic voltage sweeping (2020-01-28),
3. 10504765 - Electrostatic chuck assembly having a dielectric filler (2019-12-10),
4. 10410845 - Using bias RF pulsing to effectively clean electrostatic chuck (ESC) (2019-09-10),
5. 9748366 - [object Object] (2017-08-29),
6. 9129911 - Boron-doped carbon-based hardmask etch processing (2015-09-08),
7. 8778207 - Plasma etch processes for boron-doped carbonaceous mask layers (2014-07-15),
8. 8668837 - Method for etching substrate (2014-03-11),
9. 8231799 - Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone (2012-07-31),
10. 7846846 - Method of preventing etch profile bending and bowing in high aspect ratio openings by treating a polymer formed on the opening sidewalls (2010-12-07),
11. 7541292 - Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones (2009-06-02),
12. 7540971 - Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content (2009-06-02),
13. 7431859 - Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation (2008-10-07),
14. 7316761 - Apparatus for uniformly etching a dielectric layer (2008-01-08),
15. 7105442 - Ashable layers for reducing critical dimensions of integrated circuit features (2006-09-12),

Title: Kenny Linh Doan - Innovator from San Jose

Introduction: Kenny Linh Doan is a talented inventor based in San Jose, California, known for his groundbreaking contributions to various fields.

Latest Patents: Kenny Linh Doan holds several patents in the areas of technology and healthcare, showcasing his innovative mindset and problem-solving abilities.

Career Highlights: Throughout his career, Kenny Linh Doan has demonstrated a keen interest in developing cutting-edge solutions that have the potential to positively impact society. His work has been recognized for its creativity and practicality.

Collaborations: Kenny Linh Doan has collaborated with leading research institutions and companies to further his inventions and bring them to market. His ability to work in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Kenny Linh Doan's passion for innovation and his dedication to creating meaningful change make him a standout figure in the world of inventors. His future endeavors are eagerly anticipated as he continues to push the boundaries of what is possible.

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