The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Apr. 28, 2006
Kallol Bera, San Jose, CA (US);
Xiaoye Zhao, Mountain View, CA (US);
Kenny L. Doan, San Jose, CA (US);
Ezra Robert Gold, Sunnyvale, CA (US);
Paul Lukas Brillhart, Pleasanton, CA (US);
Bruno Geoffrion, Sunnyvale, CA (US);
Bryan Pu, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Kallol Bera, San Jose, CA (US);
Xiaoye Zhao, Mountain View, CA (US);
Kenny L. Doan, San Jose, CA (US);
Ezra Robert Gold, Sunnyvale, CA (US);
Paul Lukas Brillhart, Pleasanton, CA (US);
Bruno Geoffrion, Sunnyvale, CA (US);
Bryan Pu, San Jose, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma etch process includes injecting process gases with different compositions of chemical species through different radial gas injection zones of an overhead electrode to establish a desired distribution of chemical species among the plural gas injection zones.