Company Filing History:

33 out of 13,684

Applied Materials, Inc.

patents

3 out of 3,768

Lam Research Corporation

patents

5 out of 832,680

Other

patents

Years Active: 1997-2015

where 'Filed Patents' based on already Granted Patents

41 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8936696 - Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor (2015-01-20),

2. 8609546 - Pulsed bias plasma process to control microloading (2013-12-17),

3. 8518282 - Method of controlling etch microloading for a tungsten-containing layer (2013-08-27),

4. 8231799 - Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone (2012-07-31),

5. 8187415 - Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone (2012-05-29),

6. 7879186 - Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor (2011-02-01),

7. 7838430 - Plasma control using dual cathode frequency mixing (2010-11-23),

8. 7807064 - Halogen-free amorphous carbon mask etch having high selectivity to photoresist (2010-10-05),

9. 7736914 - Plasma control using dual cathode frequency mixing and controlling the level of polymer formation (2010-06-15),

10. 7629255 - Method for reducing microloading in etching high aspect ratio structures (2009-12-08),

11. 7541292 - Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones (2009-06-02),

12. 7540971 - Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content (2009-06-02),

13. 7432210 - Process to open carbon based hardmask (2008-10-07),

14. 7431859 - Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation (2008-10-07),

15. 7422654 - Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor (2008-09-09),

Title: Innovations of Bryan Y Pu: Pioneering Plasma Technologies

Introduction

Bryan Y Pu, based in San Jose, CA, is an accomplished inventor with a remarkable portfolio of 41 patents. His work primarily focuses on advancements in magnetic field-enhanced plasma reactors and etching processes, driving innovation in the field of semiconductor manufacturing.

Latest Patents

Among his latest contributions, Pu has developed a "Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor." This invention features a magnetic field generator designed to offer enhanced control over the magnetic field, utilizing multiple overlapping main magnetic coil sections to create a field aligned with the supporting member's surface. In another groundbreaking patent, Pu introduced a "Pulsed bias plasma process to control microloading," which provides a method for etching conductive layers through masks with varying feature sizes. This process employs a steady-state etch gas and RF power, complemented by a pulsed bias voltage oscillating between 1 to 10,000 Hz, enabling precise etching of intricate features.

Career Highlights

Throughout his career, Bryan Y Pu has worked with notable companies, including Applied Materials, Inc., where he contributed significantly to research and development in semiconductor technologies. His extensive experience and innovative approach have positioned him as a leading figure in plasma technology and etching processes.

Collaborations

Pu's work has led to fruitful collaborations with fellow researchers and inventors, including colleagues Hongching Shan and Jingbao Liu. These partnerships have fostered a collaborative environment that encourages knowledge exchange and the advancement of technology.

Conclusion

Bryan Y Pu's contributions to the field of plasma technology and etching processes demonstrate his commitment to innovation and excellence. With 41 patents to his name, he continues to shape the future of semiconductor manufacturing through groundbreaking inventions and collaborations. His work not only enhances technological capabilities but also inspires future generations of inventors in the industry.

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