Mountain View, CA, United States of America

Xiaoye Zhao

USPTO Granted Patents = 22 (Patent Applications = 1)

Average Co-Inventor Count = 6.3

ph-index = 12

Forward Citations = 1,154(Granted Patents)

Location History:

Palo Alto, CA (US) (2011)
Mountain View, CA (US) (2000 - 2014)

Company Filing History:

21 out of 13,684

Applied Materials, Inc.

patents

1 out of 987

Hgst Netherlands, B.v.

patents

Years Active: 2000-2014

where 'Filed Patents' based on already Granted Patents

22 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8828248 - Method for defect reduction in magnetic write head fabrication (2014-09-09),

2. 8231799 - Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone (2012-07-31),

3. 8048806 - Methods to avoid unstable plasma states during a process transition (2011-11-01),

4. 7575007 - Chamber recovery after opening barrier over copper (2009-08-18),

5. 7541292 - Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones (2009-06-02),

6. 7540971 - Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content (2009-06-02),

7. 7435685 - Method of forming a low-K dual damascene interconnect structure (2008-10-14),

8. 7431859 - Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation (2008-10-07),

9. 7413990 - Method of fabricating a dual damascene interconnect structure (2008-08-19),

10. 7309448 - Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material (2007-12-18),

11. 7300597 - Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material (2007-11-27),

12. 7256134 - Selective etching of carbon-doped low-k dielectrics (2007-08-14),

13. 7186943 - MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression (2007-03-06),

14. 7132618 - MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression (2006-11-07),

15. 7132369 - Method of forming a low-K dual damascene interconnect structure (2006-11-07),

Title: Innovations by Xiaoye Zhao: Pioneering Magnetic Write Head Fabrication

Introduction

Xiaoye Zhao, based in Mountain View, CA, is an accomplished inventor with a remarkable portfolio of 22 patents. His innovative contributions primarily focus on advancements in semiconductor manufacturing and magnetic write head fabrication, significantly impacting the technology sector.

Latest Patents

Among his latest patents, Zhao has developed a method for defect reduction in magnetic write head fabrication. This method utilizes reactive ion etching (RIE) to form write heads by employing a dielectric mask and a polymeric underlayer. The process is meticulously detailed, optimizing gas flow ratios and RF power levels to minimize damage to the underlayer. Furthermore, he has patented a plasma reactor apparatus designed for processing semiconductor wafers, featuring multiple gas injection zones with time-changing, separately configurable gas compositions. This innovative plasma reactor includes control mechanisms that enhance processing efficiency through dynamic gas flow adjustments.

Career Highlights

Xiaoye Zhao has held key roles in leading technology companies such as Applied Materials, Inc. and HGST Netherlands, B.V. His work at these firms has contributed significantly to advancements in semiconductor technologies and fabrication techniques, reinforcing the industry's shift towards efficiency and precision.

Collaborations

Throughout his career, Zhao has collaborated with talented professionals, including Yan Ye and Daniel John Hoffman. These partnerships have fostered an environment of innovation, allowing for the exchange of ideas and techniques that advance their shared goals in the field of technology.

Conclusion

Xiaoye Zhao's dedication to innovation and his substantial contributions to semiconductor technology embody the spirit of progress in the industry. With a strong patent portfolio and impactful collaborations, he continues to inspire future advancements in magnetic write head fabrication and plasma processing technologies.

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