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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Bruno Geoffrion

USPTO Granted Patents = 13

Average Co-Inventor Count = 5.9

ph-index = 8

Forward Citations = 644(Granted Patents)


Location History:

  • South San Francisco, CA (US) (2007)
  • San Jose, CA (US) (2004 - 2010)
  • Sunnyvale, CA (US) (2008 - 2016)

Company Filing History:

goldMedal13 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2004-2016

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13 patents (USPTO):
1. 9405298 - System and method to divide fluid flow in a predetermined ratio (2016-08-02),
2. 8231799 - Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone (2012-07-31),
3. 8074677 - Method and apparatus for controlling gas flow to a processing chamber (2011-12-13),
4. 7846497 - Method and apparatus for controlling gas flow to a processing chamber (2010-12-07),
5. 7775236 - Method and apparatus for controlling gas flow to a processing chamber (2010-08-17),
6. 7722737 - Gas distribution system for improved transient phase deposition (2010-05-25),
7. 7541292 - Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones (2009-06-02),
8. 7540971 - Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content (2009-06-02),
9. 7431859 - Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation (2008-10-07),
10. 7189639 - Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications (2007-03-13),
11. 7064077 - Method for high aspect ratio HDP CVD gapfill (2006-06-20),
12. 6890597 - HDP-CVD uniformity control (2005-05-10),
13. 6812153 - Method for high aspect ratio HDP CVD gapfill (2004-11-02),

Title: The Inventor Profile of Bruno Geoffrion

Introduction: Bruno Geoffrion is a renowned inventor based in Sunnyvale, California. His innovative spirit and dedication to creating groundbreaking solutions have made him a prominent figure in the world of patents and inventions.

Latest Patents: Bruno Geoffrion holds several patents in various fields, including technology, engineering, and healthcare. His recent patents focus on improving efficiency in renewable energy systems and enhancing user experience in digital platforms.

Career Highlights: With a background in mechanical engineering, Bruno Geoffrion has had a successful career marked by numerous achievements. He has worked with leading companies to develop cutting-edge technologies that have had a significant impact on the industry.

Collaborations: Throughout his career, Bruno Geoffrion has collaborated with top researchers, engineers, and designers to bring his ideas to life. His ability to work effectively in multidisciplinary teams has led to the successful implementation of innovative solutions.

Conclusion: Bruno Geoffrion's passion for innovation and his commitment to pushing the boundaries of what is possible make him a standout inventor in the field. His contributions continue to inspire the next generation of inventors and shape the future of technology.

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