The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
May. 09, 2003
Padmanabhan Krishnaraj, San Francisco, CA (US);
Bruno Geoffrion, San Jose, CA (US);
Michael S. Cox, Davenport, CA (US);
Lin Zhang, San Jose, CA (US);
Bikram Kapoor, Santa Clara, CA (US);
Anchuan Wang, Fremont, CA (US);
Zhenjiang Cui, San Jose, CA (US);
Padmanabhan Krishnaraj, San Francisco, CA (US);
Bruno Geoffrion, San Jose, CA (US);
Michael S. Cox, Davenport, CA (US);
Lin Zhang, San Jose, CA (US);
Bikram Kapoor, Santa Clara, CA (US);
Anchuan Wang, Fremont, CA (US);
Zhenjiang Cui, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A combination of deposition and polishing steps are used to permit improved uniformity of a film after the combination of steps. Both the deposition and polishing are performed with processes that vary across the substrate. The combination of the varying deposition and etching rates results in a film that is substantially planar after the film has been polished. In some instances, it may be easier to control the variation of one of the two processes than the other so that the more controllable process is tailored to accommodate nonuniformities introduced by the less controllable process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile