The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Oct. 05, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Haitao Wang, Fremont, CA (US);
Michael G. Chafin, Santa Clara, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Yue Guo, Redwood City, CA (US);
Valentin Todorow, Palo Alto, CA (US);
Kenny Doan, San Jose, CA (US);
Sergio F. Shoji, San Jose, CA (US);
Brad L. Mays, Findlay, OH (US);
Usama Dadu, Hollister, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A method, apparatus and system for dechucking a processing object from a surface of an electrostatic chuck (ESC) in a processing chamber can include applying to the ESC for a first time interval, a first dechuck voltage having a substantially equal magnitude and opposite polarity of a chuck voltage chucking the processing object to the surface of the ESC, selecting a second dechuck voltage having an opposite polarity as the first dechuck voltage, linearly sweeping the ESC voltage from the first dechuck voltage to the second dechuck voltage over a second time interval, monitoring the ESC current during the second time interval until a current spike in the ESC current above a threshold is detected, communicating a command to move support pins up to remove the processing object from the ESC surface, and maintaining the second dechuck voltage until the processing object is separated from the surface of the ESC.