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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Michael G Chafin

USPTO Granted Patents = 15 

Average Co-Inventor Count = 5.2

ph-index = 9

Forward Citations = 490(Granted Patents)


Location History:

  • Underhill, VT (US) (1997)
  • San Jose, CA (US) (1999 - 2004)
  • Santa Clara, CA (US) (2010 - 2022)

Company Filing History:

goldMedal15 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 1997-2022

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15 patents (USPTO):
1. 11447868 - Method for controlling a plasma process (2022-09-20),
2. 10840062 - Radio frequency filter system for a processing chamber (2020-11-17),
3. 10546731 - Method, apparatus and system for wafer dechucking using dynamic voltage sweeping (2020-01-28),
4. 9601301 - Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment (2017-03-21),
5. 9070536 - Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface (2015-06-30),
6. 8580693 - Temperature enhanced electrostatic chucking in plasma processing apparatus (2013-11-12),
7. 8270141 - Electrostatic chuck with reduced arcing (2012-09-18),
8. 7838430 - Plasma control using dual cathode frequency mixing (2010-11-23),
9. 7813103 - Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes (2010-10-12),
10. 6824748 - Heated catalytic treatment of an effluent gas from a substrate fabrication process (2004-11-30),
11. 6273958 - Substrate support for plasma processing (2001-08-14),
12. 6151203 - Connectors for an electrostatic chuck and combination thereof (2000-11-21),
13. 6095084 - High density plasma process chamber (2000-08-01),
14. 5903428 - Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas (1999-05-11),
15. 5636098 - Barrier seal for electrostatic chuck (1997-06-03),

Title: The Innovations of Michael G. Chafin

Introduction

Michael G. Chafin, a prominent inventor based in Santa Clara, CA, has distinguished himself in the realm of plasma processing technologies, holding a remarkable 15 patents. His work significantly contributes to advancing methods in controlling plasma processes, showcasing his innovative spirit and technical expertise.

Latest Patents

Michael's latest inventions include a "Method for controlling a plasma process," which details an apparatus and method for tuning a plasma process within a plasma processing chamber. This innovative work features a heater assembly with a resistive heating element coupled to an RF filter and a tunable circuit element for adjusting impedance. Another recent patent, the "Radio frequency filter system for a processing chamber," describes a sophisticated RF filter system designed to enhance substrate processing. This system comprises multiple stages configured to reject specific frequencies, utilizing inductors and capacitors to achieve optimal performance.

Career Highlights

Chafin’s professional journey is marked by his tenure at Applied Materials, Inc., where he applies his skills to advance semiconductor technology. His contributions have greatly impacted the efficiency and precision of plasma processing techniques, driving innovations that benefit the industry at large.

Collaborations

Throughout his career, Michael has collaborated with influential colleagues, including Dennis Stanley Grimard and Shamouil Shamouilian. These partnerships not only enhance the development of groundbreaking technologies but also foster a rich exchange of ideas that propel the field forward.

Conclusion

Michael G. Chafin stands out as a visionary inventor in plasma processing technology. His extensive patent portfolio and collaborative efforts within the industry underscore his commitment to innovation and excellence. As technology continues to evolve, Chafin's contributions will undoubtedly influence future advancements in this critical field.

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