The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Apr. 05, 2011
Sergey G. Belostotskiy, Sunnyvale, CA (US);
Michael G. Chafin, Santa Clara, CA (US);
Jingbao Liu, Sunnyvale, CA (US);
David Palagashvili, Mountain View, CA (US);
Sergey G. Belostotskiy, Sunnyvale, CA (US);
Michael G. Chafin, Santa Clara, CA (US);
Jingbao Liu, Sunnyvale, CA (US);
David Palagashvili, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and systems for temperature enhanced chucking and dechucking of resistive substrates in a plasma processing apparatus are described herein. In certain embodiments, methods and systems incorporate modulating a glass carrier substrate temperature during a plasma etch process to chuck and dechuck the carrier at first temperatures elevated relative to second temperatures utilized during plasma etching. In embodiments, one or more of plasma heat, lamp heat, resistive heat, and fluid heat transfer are controlled to modulate the carrier substrate temperature between chucking temperatures and process temperatures with each run of the plasma etch process.