The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2001

Filed:

Jun. 09, 1999
Applicant:
Inventors:

Shamouil Shamouilian, San Jose, CA (US);

Ananda H. Kumar, Milpitas, CA (US);

Siamak Salimian, Sunnyvale, CA (US);

Mahmoud Dahimene, Gaithersburg, MD (US);

Michael G. Chafin, San Jose, CA (US);

Dennis S. Grimard, Ann Arbor, MI (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
Abstract

A support,comprises a dielectric,covering a primary electrode,the dielectric,having a surface,adapted to receive a substrate,and a conduit,that extends through the dielectric,The thickness of a portion of the dielectric,between an edge,of the primary electrode,and a surface,of the conduit,is sufficiently large to reduce the incidence of plasma formation in the conduit,when the primary electrode,is charged by an RF voltage to form a plasma of gas in the chamber,during processing of the substrate


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