The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
May. 20, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sergey G. Belostotskiy, Santa Clara, CA (US);
Chinh Dinh, San Jose, CA (US);
Andrew Nguyen, San Jose, CA (US);
Michael G. Chafin, Santa Clara, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/00 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01J 37/00 (2013.01); H01J 37/32715 (2013.01); H01J 37/32935 (2013.01); H01L 21/6833 (2013.01);
Abstract
A direct (DC) voltage is applied to an electrode at a voltage value to clamp a workpiece to an electrostatic chuck in a processing chamber. The electrode is embedded into the electrostatic chuck. An electrostatic chuck current through the electrode at the DC voltage is measured. A DC self bias induced on the workpiece by a plasma is determined based on the electrostatic chuck current and the applied voltage.