The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2008
Filed:
Feb. 03, 2003
Kenny L. Doan, San Jose, CA (US);
Yunsang Kim, San Jose, CA (US);
Mahmoud Dahimene, Gaithersburg, MD (US);
Jingbao Liu, Sunnyvale, CA (US);
Bryan Pu, San Jose, CA (US);
Hongqing Shan, Cupertino, CA (US);
Don Curry, Meridian, ID (US);
Kenny L. Doan, San Jose, CA (US);
Yunsang Kim, San Jose, CA (US);
Mahmoud Dahimene, Gaithersburg, MD (US);
Jingbao Liu, Sunnyvale, CA (US);
Bryan Pu, San Jose, CA (US);
Hongqing Shan, Cupertino, CA (US);
Don Curry, Meridian, ID (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus for plasma etching a layer of material upon a substrate comprising an anode having a first region protruding from a second region, wherein the second region defines a plane and the first region extends from said plane. In one embodiment, at least one solenoid is disposed near the apparatus to magnetize the plasma.