The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Sep. 19, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jong Mun Kim, San Jose, CA (US);
Kenny L. Doan, San Jose, CA (US);
Li Ling, San Jose, CA (US);
Jairaj Payyapilly, Sunnyvale, CA (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Daisuke Shimizu, Sunnyvale, CA (US);
Yuju Huang, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 29/66 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66833 (2013.01); H01L 21/31116 (2013.01);
Abstract
An article having alternating oxide layers and nitride layers is etched by an etch process. The etch process includes providing a first gas comprising CFHin a chamber of an etch reactor, ionizing the CFHcontaining gas to produce a plasma comprising a plurality of ions, and etching the article using the plurality of ions.