Li Ling

Title: The Innovative Contributions of Li Ling

Introduction

Li Ling is a prominent inventor based in San Jose, CA, known for her significant contributions to the field of semiconductor technology. With a total of 4 patents to her name, she has made remarkable advancements that enhance the efficiency and effectiveness of plasma etching processes.

Latest Patents

Li Ling's latest patents include a method and apparatus for etching a semiconductor substrate in a plasma etch chamber. This innovative method involves exposing a substrate to plasma while applying a voltage waveform to an electrode, optimizing the etching process through a series of macro and micro etch cycles. Another notable patent focuses on using bias RF pulsing to effectively clean electrostatic chucks in plasma processing chambers, ensuring that polymer byproducts are efficiently removed from the interior surfaces.

Career Highlights

Li Ling is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work has significantly contributed to the development of advanced manufacturing techniques that are crucial for the production of high-performance electronic devices.

Collaborations

Throughout her career, Li Ling has collaborated with talented professionals, including Daisuke Shimizu and Wonseok Lee, who have contributed to her innovative projects and research.

Conclusion

Li Ling's contributions to semiconductor technology through her patents and collaborations highlight her role as a key innovator in the field. Her work continues to influence advancements in plasma etching processes, showcasing the importance of innovation in technology.