Katsumi Ohmori

Title: The Innovative Contributions of Katsumi Ohmori

Introduction

Katsumi Ohmori is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of pattern forming methods, holding a total of 10 patents. His work has advanced the technology used in various industries, particularly in semiconductor manufacturing.

Latest Patents

Ohmori's latest patents include a novel pattern forming method that involves several intricate steps. This method begins with the formation of a first organic film by coating an etching target film with a polymer composition. The process continues with the infiltration of an inorganic substance into the first organic film, followed by the cross-linking of the polymer. A second organic film is then formed on the first organic film, which is patterned to create a second organic film pattern. The first organic film is subsequently patterned using a self-aligned method, leading to a reduction in pitch. This innovative approach allows for the creation of highly precise patterns essential for modern technology.

Another notable patent focuses on a pattern forming method that includes the formation of a first film patterned in a line and space shape on an underlayer film. This method involves covering the first film with a second film, followed by the removal of the second film to create a line shape on the side surface of the first film. The process is further enhanced by the use of an organic metal compound that increases etching tolerance, showcasing Ohmori's expertise in developing advanced materials for patterning.

Career Highlights

Throughout his career, Katsumi Ohmori has worked with leading companies in the industry, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field of semiconductor technology.

Collaborations

Ohmori has collaborated with notable colleagues such as Tasuku Matsumiya and Tsuyoshi Kurosawa. These partnerships have fostered a creative environment that has led to the development of innovative solutions in pattern forming methods.

Conclusion

Katsumi Ohmori's contributions to the field of pattern forming methods have significantly impacted the semiconductor industry. His innovative patents and collaborations with industry leaders highlight his role as a key figure in advancing technology. His work continues to inspire future innovations in the field.