The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Oct. 22, 2014
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Tsuyoshi Kurosawa, Kawasaki, JP;

Daiju Shiono, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Tasuku Matsumiya, Kawasaki, JP;

Hitoshi Yamano, Kawasaki, JP;

Taku Hirayama, Kawasaki, JP;

Katsumi Ohmori, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/30 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); C08L 33/26 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); C08L 33/26 (2013.01); G03F 7/0002 (2013.01); B82Y 30/00 (2013.01);
Abstract

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.


Find Patent Forward Citations

Loading…