Kawasaki, Japan

Tasuku Matsumiya

This inventor holds 33 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Resist Composition Technology. Top assignees: Tokyo Ohka Kogyo Co., Ltd., The University of Chicago, Samsung Electronics Co., Ltd.. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tasuku Matsumiya. Retrieved from https://idiyas.com/inventor/tasuku-matsumiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 33 

% Patents Active = 97.0


Average Co-Inventor Count = 5.0

ph-index = 6

Forward Citations = 85(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2011 - 2018)
  • Kawasaki, JP (2008 - 2023)

Company Filing History:


Years Active: 2008-2025

Loading Chart...
Loading Chart...
Areas of Expertise:
Resist Composition
Phase-Separated Structure
Semiconductor Patterns
Block Copolymer
Positive Photoresist
Pattern Formation
Polymeric Compound
Undercoat Agent
33 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Tasuku Matsumiya

Introduction

Tasuku Matsumiya is a prolific inventor based in Kawasaki, Japan. With a remarkable portfolio of 32 patents to his name, he has made significant contributions to the fields of resist compositions and phase-separated structures.

Latest Patents

Among Tasuku's latest patents is a resist composition and method for forming a resist pattern. This innovation involves a unique blend of materials, including a base material component, a first acid generator, and a second acid generator. The first acid generator is represented by General Formula (b1), while the second acid generator comprises a compound characterized by an anionic moiety with a molar volume of 250 cm/mol or less. Notably, the anion moiety of this second compound is smaller than that of the first acid generator. Additionally, he has developed a resin composition aimed at forming a phase-separated structure, which includes a block copolymer and an ionic liquid containing a specific compound with a high dipole moment.

Career Highlights

Tasuku Matsumiya's career includes significant positions at Tokyo Ohka Kogyo Co., Ltd. and the University of Chicago, where he has further honed his expertise in the field of materials science. His innovative work in resist compositions has been crucial for advancements in photolithography processes.

Collaborations

Throughout his career, Matsumiya has collaborated with notable individuals such as Daiju Shiono and Takahiro Dazai. These partnerships have fostered a dynamic exchange of ideas and expertise, contributing to the success of their joint research efforts.

Conclusion

In conclusion, Tasuku Matsumiya has established himself as a key figure in materials innovation. His extensive patent portfolio demonstrates his commitment to advancing technology, particularly in the realm of resist compositions and phase-separated structures. His collaborations and career experiences reflect his dedication to research and development in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…