Location History:
- Kanagawa-ken, JP (2011 - 2018)
- Kawasaki, JP (2008 - 2023)
Company Filing History:
Years Active: 2008-2025
Title: Innovations and Contributions of Tasuku Matsumiya
Introduction
Tasuku Matsumiya is a prolific inventor based in Kawasaki, Japan. With a remarkable portfolio of 32 patents to his name, he has made significant contributions to the fields of resist compositions and phase-separated structures.
Latest Patents
Among Tasuku's latest patents is a resist composition and method for forming a resist pattern. This innovation involves a unique blend of materials, including a base material component, a first acid generator, and a second acid generator. The first acid generator is represented by General Formula (b1), while the second acid generator comprises a compound characterized by an anionic moiety with a molar volume of 250 cm/mol or less. Notably, the anion moiety of this second compound is smaller than that of the first acid generator. Additionally, he has developed a resin composition aimed at forming a phase-separated structure, which includes a block copolymer and an ionic liquid containing a specific compound with a high dipole moment.
Career Highlights
Tasuku Matsumiya's career includes significant positions at Tokyo Ohka Kogyo Co., Ltd. and the University of Chicago, where he has further honed his expertise in the field of materials science. His innovative work in resist compositions has been crucial for advancements in photolithography processes.
Collaborations
Throughout his career, Matsumiya has collaborated with notable individuals such as Daiju Shiono and Takahiro Dazai. These partnerships have fostered a dynamic exchange of ideas and expertise, contributing to the success of their joint research efforts.
Conclusion
In conclusion, Tasuku Matsumiya has established himself as a key figure in materials innovation. His extensive patent portfolio demonstrates his commitment to advancing technology, particularly in the realm of resist compositions and phase-separated structures. His collaborations and career experiences reflect his dedication to research and development in his field.