The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Aug. 06, 2014
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Tsuyoshi Kurosawa, Kawasaki, JP;

Daiju Shiono, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Tasuku Matsumiya, Kawasaki, JP;

Kenichiro Miyashita, Kawasaki, JP;

Katsumi Ohmori, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); C09D 153/00 (2006.01); B05D 1/00 (2006.01); B05D 3/02 (2006.01); C08L 53/00 (2006.01); G02B 1/111 (2015.01); B81C 1/00 (2006.01); B05D 1/34 (2006.01);
U.S. Cl.
CPC ...
B05D 5/00 (2013.01); B05D 1/005 (2013.01); B05D 3/02 (2013.01); B81C 1/00031 (2013.01); C08L 53/00 (2013.01); C09D 153/00 (2013.01); G02B 1/111 (2013.01); B05D 1/34 (2013.01); B81C 2201/0149 (2013.01);
Abstract

A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.


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