The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Jan. 22, 2015
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takehiro Seshimo, Kawasaki, JP;

Takaya Maehashi, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Tasuku Matsumiya, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Daiju Shiono, Kawasaki, JP;

Tsuyoshi Kurosawa, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/00 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/36 (2006.01); G03F 7/38 (2006.01); C09D 153/00 (2006.01); C09D 183/10 (2006.01); B82Y 40/00 (2011.01); B81C 1/00 (2006.01); C08G 18/61 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B81C 1/00031 (2013.01); B82Y 40/00 (2013.01); C08G 18/61 (2013.01); C09D 153/00 (2013.01); C09D 183/10 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); B81C 2201/0149 (2013.01); G03F 7/0752 (2013.01);
Abstract

A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.


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