The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Nov. 08, 2016
Applicants:

Jeong-ju Park, Hwaseong-si, KR;

Seung-chul Kwon, Suwon-si, KR;

Eun-sung Kim, Seoul, KR;

Kyeong-mi Lee, Suwon-si, KR;

Shi-yong Yi, Seongnam-si, KR;

Tsuyosh Kurosawa, Kanagawa-ken, JP;

Katsumi Ohmori, Kanagawa-ken, JP;

Tasuku Matsumiya, Kanagawa-ken, JP;

Inventors:

Jeong-Ju Park, Hwaseong-si, KR;

Seung-Chul Kwon, Suwon-si, KR;

Eun-Sung Kim, Seoul, KR;

Kyeong-Mi Lee, Suwon-si, KR;

Shi-Yong Yi, Seongnam-si, KR;

Tsuyosh Kurosawa, Kanagawa-ken, JP;

Katsumi Ohmori, Kanagawa-ken, JP;

Tasuku Matsumiya, Kanagawa-ken, JP;

Assignees:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-do, KR;

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/16 (2006.01); H01L 27/108 (2006.01); C08F 20/28 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C08L 53/00 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/165 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 20/28 (2013.01); C08L 53/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0035 (2013.01); G03F 7/2022 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 27/10844 (2013.01); H01L 28/00 (2013.01); B81C 2201/0149 (2013.01);
Abstract

In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.


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