The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

May. 09, 2016
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Hitoshi Yamano, Kawasaki, JP;

Tasuku Matsumiya, Kawasaki, JP;

Tsuyoshi Kurosawa, Kawasaki, JP;

Taku Hirayama, Kawasaki, JP;

Ken Miyagi, Kawasaki, JP;

Katsumi Ohmori, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01);
Abstract

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance Ra(MPa) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1).4.1≤≤9  (1)


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