The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Feb. 05, 2013
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Tokyo Electron Limited, Tokyo, JP;
Naoto Motoike, Kawasaki, JP;
Katsumi Ohmori, Kawasaki, JP;
Toshiaki Hato, Kawasaki, JP;
Hidetami Yaegashi, Tokyo, JP;
Kenichi Oyama, Tokyo, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method of forming a pattern including applying a resist composition to a substrate to form a resist film, and then subjecting the resist film to exposure and development, thereby forming a first pattern containing a resist film; forming a SiOfilm on the surface of the first pattern and the substrate; subjecting the SiOto etching such that the SiOfilm remains only on a side wall portion of the first pattern; and removing the first pattern, thereby forming a second pattern containing the SiOfilm. The resist composition contains a base component that exhibits changed solubility in a developing solution under action of an acid, and an acid generator component that generates acid upon exposure, the base component containing a resin component containing a structural unit having an acid decomposable group which exhibits increased polarity by the action of acid and has no polycyclic group.