Kawasaki, Japan

Naoto Motoike


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2009-2016

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10 patents (USPTO):Explore Patents

Title: Naoto Motoike: Innovator in Pattern Formation Technology

Introduction

Naoto Motoike is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to the field of pattern formation technology. With a total of 10 patents to his name, he has made remarkable advancements that have influenced various industries.

Latest Patents

One of Motoike's latest patents is a method of forming a pattern that involves applying a resist composition to a substrate to create a resist film. This film is then subjected to exposure and development, resulting in a first pattern containing the resist film. Following this, a SiO film is formed on the surface of the first pattern and the substrate. The SiO is then etched so that it remains only on the side wall portion of the first pattern, and the first pattern is removed, leading to the formation of a second pattern containing the SiO film. The resist composition used in this process includes a base component that changes solubility in a developing solution under the action of an acid, along with an acid generator component that produces acid upon exposure.

Another notable patent involves a resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution due to the action of the acid. This composition contains a high-molecular weight compound with specific structural units that enhance its performance in pattern formation.

Career Highlights

Throughout his career, Naoto Motoike has worked with leading companies in the semiconductor industry, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Electron Limited. His work has been instrumental in advancing technologies that are critical to the manufacturing processes in these companies.

Collaborations

Motoike has collaborated with notable professionals in his field, including Tsuyoshi Nakamura and Yoshiyuki Utsumi. These collaborations have further enriched his work and contributed to the development of innovative solutions in pattern formation.

Conclusion

Naoto Motoike's contributions to the field of pattern formation technology are significant and impactful. His innovative patents and collaborations with industry leaders highlight his role as a key figure in advancing this important area of technology.

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