The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Feb. 20, 2014
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Tokyo Institute of Technology, Tokyo, JP;
Tasuku Matsumiya, Kawasaki, JP;
Takehiro Seshimo, Kawasaki, JP;
Katsumi Ohmori, Kawasaki, JP;
Ken Miyagi, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Kenichiro Miyashita, Kawasaki, JP;
Tsuyoshi Kurosawa, Kawasaki, JP;
Teruaki Hayakawa, Tokyo, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
TOKYO INSTITUTE OF TECHNOLOGY, Tokyo, JP;
Abstract
A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.