The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Jun. 14, 2018
Tokyo Electron Limited, Tokyo, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Kazuki Yamada, Yamanashi, JP;
Masatoshi Yamato, Miyagi, JP;
Hidetami Yaegashi, Tokyo, JP;
Yoshitaka Komuro, Kanagawa, JP;
Takehiro Seshimo, Kanagawa, JP;
Katsumi Ohmori, Kanagawa, JP;
Tokyo Electron Limited, Tokyo, JP;
TOKYO OHKA KOGYO CO., LTD., Kanagawa, JP;
Abstract
A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.