logo

For the Inventor, By the Inventor

Lilienthal, Germany

Jörg Rottstegge

This inventor holds 12 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jörg Rottstegge. Retrieved from https://idiyas.com/inventor/jörg-rottstegge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12

% Patents Active = 8.3

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 198(Granted Patents)


Location History:

  • Lilienthal, DE (2005 - 2006)
  • Erlangen, DE (2005 - 2006)

Company Filing History:

goldMedal12 out of 15,023 
 
Infineon Technologies Ag
 patents

Years Active: 2005-2006

Loading Chart...
12 patents (USPTO):Explore Patents
1. 7125640 - Resist for photolithography having reactive groups for subsequent modification of the resist structures (2006-10-24),
2. 7067234 - Chemical consolidation of photoresists in the UV range (2006-06-27),
3. 7052820 - Silicon-containing resist for photolithography (2006-05-30),
4. 7045274 - Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification (2006-05-16),
5. 7041426 - Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography (2006-05-09),
6. 7033740 - Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm (2006-04-25),
7. 7018784 - Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity (2006-03-28),
8. 6998215 - Negative resist process with simultaneous development and chemical consolidation of resist structures (2006-02-14),
9. 6974655 - Silicon resist for photolithography at short exposure wavelengths and process for making photoresists (2005-12-13),
10. 6946236 - Negative resist process with simultaneous development and aromatization of resist structures (2005-09-20),
11. 6899997 - Process for modifying resist structures and resist films from the aqueous phase (2005-05-31),
12. 6893972 - Process for sidewall amplification of resist structures and for the production of structures having reduced structure size (2005-05-17),

Title: Jörg Rottstegge - Innovator from Lilienthal

Introduction: Jörg Rottstegge is a renowned inventor hailing from Lilienthal, Germany, known for his groundbreaking contributions to various fields.

Latest Patents: Jörg Rottstegge holds several patents in the areas of renewable energy, sustainable technologies, and advanced manufacturing processes.

Career Highlights: With a career spanning over two decades, Jörg Rottstegge has worked with leading research institutions and companies to develop innovative solutions that have had a significant impact on the industry.

Collaborations: Throughout his career, Jörg Rottstegge has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence.

Conclusion: Jörg Rottstegge's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…