The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Sep. 03, 2002
Jörg Rottstegge, Lilienthal, DE;
Eberhard Kühn, Hemhofen, DE;
Waltraud Herbst, Uttenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Jörg Rottstegge, Lilienthal, DE;
Eberhard Kühn, Hemhofen, DE;
Waltraud Herbst, Uttenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The novel process lends itself to the production of highly resolved resist structures. A resist structure having webs is produced from a photoresist on a substrate and then the sidewalls of the webs are selectively chemically amplified so that chemically amplified sidewall structures are obtained. After the removal of the chemically unamplified sections, the amplified sidewall structures are transferred to the substrate. The process permits a resolution of structures that are not producible using the currently customary exposure wavelengths.