Uttenreuth, Germany

Waltraud Herbst


Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 224(Granted Patents)


Company Filing History:


Years Active: 2003-2006

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8 patents (USPTO):Explore Patents

Title: Innovator Waltraud Herbst: Pioneering Advances in Photolithography

Introduction

Waltraud Herbst, a notable inventor based in Uttenreuth, Germany, has made significant contributions to the field of photolithography. With a total of eight patents to her name, she is recognized for her innovative approaches to complex technological challenges in this domain.

Latest Patents

Among her latest patents, two stand out for their relevance and impact. The first is titled "Apparatus and method for proof of outgassing products," which addresses the issue of outgassing during the exposure of photoresist systems to laser irradiation. This invention involves the adsorption of these outgassing products onto a proof plate for further analysis. The second patent, "Silicon-containing resist for photolithography," describes a photoresist that includes a polymer chain composed of alternating silicon and oxygen atoms, with a carbon chain segment that is linked as a side chain. This innovative design allows for the construction of a chemically amplified photoresist capable of enhancing the efficacy of photolithography processes.

Career Highlights

Throughout her career, Waltraud Herbst has worked with leading companies in the technology sector, including Infineon Technologies AG and Siemens Aktiengesellschaft. Her experience in these prominent firms has provided her with the expertise required to drive her inventive solutions forward.

Collaborations

Waltraud has collaborated with fellow innovators in her field, including Christian Eschbaumer and Christoph Hohle. These partnerships have played a crucial role in fostering creativity and enhancing the research and development of her patented technologies.

Conclusion

As a trailblazer in the field of photolithography, Waltraud Herbst continues to be an influential figure, with her patents reflecting her dedication to technological advancement. Her work not only exemplifies innovation but also showcases the importance of collaboration in achieving groundbreaking results in the realm of inventions.

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