The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Jul. 01, 2002
Applicant:
Inventors:
Jörg Rottstegge, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Waltraud Herbst, Uttenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; G03C 1/492 ;
U.S. Cl.
CPC ...
G03F 7/00 ; G03C 1/492 ;
Abstract
The invention relates to a process for producing amplified negative resist structures in which, following exposure and contrasting of the resist in a developing step, the resist structure is simultaneously developed and silylated. This substantially simplifies the production of amplified resist structures.