Schwaig, Germany

Christian Eschbaumer


Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 202(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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10 patents (USPTO):Explore Patents

Title: The Innovations of Christian Eschbaumer

Introduction

Christian Eschbaumer is an inventive mind based in Schwaig, Germany, known for his significant contributions to the field of photolithography. With a total of 10 patents to his name, he has been at the forefront of developing innovative materials and processes that enhance photographic applications in technology.

Latest Patents

One of his notable inventions is a **silicon-containing resist for photolithography**. This innovative photoresist consists of a polymer chain that alternates between silicon and oxygen atoms, with a side chain composed of carbon atoms featuring acid-labile groups. This design ensures that the photoresist can be employed as a chemically amplified photoresist, which increases efficiency in photolithography applications.

Another recent patent is the **process for silylating photoresists in the UV range**. This invention outlines a method for amplifying structured resists by facilitating a reaction between nucleophilic groups and isocyanate or thiocyanate groups. This process allows for quicker amplification reactions and utilizes polymers that maintain high transparency at wavelengths shorter than 200 nm, specifically at 157 nm.

Career Highlights

Christian Eschbaumer is currently employed at Infineon Technologies AG, a leading global semiconductor manufacturer. His work focuses on advancing photolithographic technologies, a critical aspect of semiconductor production. Throughout his career, he has demonstrated a commitment to pushing the boundaries of technology through his inventive solutions.

Collaborations

In his professional journey, Eschbaumer has worked alongside prominent innovators such as Christoph Hohle and Michael Sebald. Their collaborative efforts have enriched their research and led to significant advancements in their respective areas of expertise.

Conclusion

Christian Eschbaumer's contributions to the field of photolithography reflect his profound understanding of polymer science and his innovative spirit. With a growing portfolio of patents, he continues to significantly impact the technological landscape, paving the way for future advancements in semiconductor manufacturing. His dedication to innovation exemplifies the essential role inventors play in scientific and industrial progress.

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