The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Oct. 31, 2002
Jens Ferbitz, Siegen, DE;
Werner Mormann, Siegen, DE;
Jens Rottstegge, Lilienthal, DE;
Christoph Hohle, Bubenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Michael Sebald, Weisendorf, DE;
Jens Ferbitz, Siegen, DE;
Werner Mormann, Siegen, DE;
Jens Rottstegge, Lilienthal, DE;
Christoph Hohle, Bubenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Michael Sebald, Weisendorf, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A process for the amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the thiocyanate group in addition to the nucleophilic group form a reaction pair. One of the partners is provided on the polymer and the other partner on the amplification agent. The amplification reaction takes place more rapidly than a linkage to carboxylic anhydride groups. Furthermore, the amplification reaction permits the use of polymers that have high transparency at short wavelengths of less than 200 nm, in particular 157 nm.