Jens Ferbitz

Title: Jens Ferbitz: Innovator in Photoresist Technology

Introduction

Jens Ferbitz is a notable inventor based in Siegen, Germany. He has made significant contributions to the field of photoresist technology, particularly in the area of silylation processes. His innovative work has led to advancements that enhance the performance of structured resists used in various applications.

Latest Patents

Jens Ferbitz holds a patent for a process titled "Process for silylating photoresists in the UV range." This process involves a reaction between a nucleophilic group and an isocyanate or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The method allows for a more rapid amplification reaction compared to traditional linkage methods, enabling the use of polymers that maintain high transparency at short wavelengths, particularly at 157 nm.

Career Highlights

Jens Ferbitz is currently employed at Infineon Technologies AG, where he continues to develop innovative solutions in the semiconductor industry. His expertise in photoresist technology has positioned him as a key player in advancing manufacturing processes that require high precision and efficiency.

Collaborations

Throughout his career, Jens has collaborated with esteemed colleagues such as Werner Mormann and Jens Rottstegge. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Jens Ferbitz is a prominent inventor whose work in photoresist technology has made a lasting impact on the industry. His innovative processes and collaborations continue to drive advancements in semiconductor manufacturing.