Company Filing History:
Years Active: 2006
Title: Inventor Jens Rottstegge: Innovating Photoresist Technology
Introduction
Jens Rottstegge, an innovative inventor located in Lilienthal, Germany, has made significant contributions to the field of photoresist technology. With a patent to his name, he has demonstrated his expertise in the amplification of structured resists, showcasing his ability to merge chemistry with cutting-edge technology.
Latest Patents
Rottstegge's notable patent, titled "Process for silylating photoresists in the UV range," addresses a breakthrough methodology for enhancing structured resists. This process revolves around a chemical reaction between a nucleophilic group and either an isocyanate or thiocyanate group, enabling the linking of an amplification agent to a polymer present in the photoresist. This innovation facilitates faster amplification reactions compared to traditional methods, making it suitable for use with polymers that remain transparent at short wavelengths below 200 nm, specifically at 157 nm, significantly advancing photoresist applications.
Career Highlights
Currently employed at Infineon Technologies AG, Rottstegge has positioned himself as a key player in the development and refinement of photoresist technologies. His work is not only pivotal in advancing the semiconductor industry but also demonstrates his dedication to innovation in materials science.
Collaborations
Throughout his career, Rottstegge has had the opportunity to work alongside esteemed colleagues such as Jens Ferbitz and Werner Mormann. These collaborations have likely bolstered the quality and scope of his research, providing a foundation for impactful advancements in the field of photoresists.
Conclusion
Jens Rottstegge exemplifies the spirit of innovation through his patent in photoresist technology and his active role at Infineon Technologies AG. His contributions reflect the importance of scientific research and collaboration in driving advancements that have the potential to transform various technological applications.