The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
Sep. 03, 2002
Jörg Rottstegge, Lilienthal, DE;
Christoph Hohle, Bubenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Michael Sebald, Weisendorf, DE;
Wolf-dieter Domke, Adelsdorf, DE;
Jörg Rottstegge, Lilienthal, DE;
Christoph Hohle, Bubenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Michael Sebald, Weisendorf, DE;
Wolf-Dieter Domke, Adelsdorf, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A chemically amplified photo-resist includes a polymer containing acid-labile radicals attached to a polar group and also contains anchor groups that allow attachment of a consolidating agent. The polymer includes first repeating units containing siloxane groups. The photoresist on the one hand exhibits an enhanced transparency for short-wavelength radiation and on the other hand permits chemical consolidation of the structured resist. A process for producing structured resists is a also described.