The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2005
Filed:
Jul. 01, 2002
Jörg Rottstegge, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Christian Eschbaumer, Schwaig, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Jörg Rottstegge, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Christian Eschbaumer, Schwaig, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The invention relates to a process for producing amplified negative resist structures in which, following exposure and contrasting of the resist, the resist structure is simultaneously developed and aromatized. This substantially simplifies the production of amplified resist structures. Amplifying agents include compounds having not only a reactive group for attachment to an anchor group of the polymer, but also at least one aromatic group.