The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Jul. 19, 2002
Applicants:
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Michael Sebald, Weisendorf, DE;
Jörg Rottstegge, Erlangen, DE;
Inventors:
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Michael Sebald, Weisendorf, DE;
Jörg Rottstegge, Erlangen, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoresist includes a polymer which has acid-cleavable groups in its main chain. The polymer can thus be cleaved by acid into short cleavage products which can be removed from the substrate through the use of a developer. The polymer is completely or partially fluorinated, and consequently has an improved transparency to light of short wavelengths.