The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jul. 30, 2002
Jörg Rottstegge, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Waltraud Herbst, Uttenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Michael Sebald, Weisendorf, DE;
Jörg Rottstegge, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Waltraud Herbst, Uttenreuth, DE;
Christian Eschbaumer, Schwaig, DE;
Christoph Hohle, Bubenreuth, DE;
Michael Sebald, Weisendorf, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A photoresist includes a polymer having a main chain composed of alternating silicon and oxygen atoms and a polymer chain segment which linked as a side chain to the main chain and whose chain is composed of carbon atoms. The chain composed of carbon atoms includes acid-labile groups, so that the photoresist according to the invention can be constructed as a chemically amplified photoresist.