The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Feb. 27, 2003
Jörg Rottstegge, Lilienthal, DE;
Waltraud Herbst, Uttenreuth, DE;
Gertrud Falk, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Jörg Rottstegge, Lilienthal, DE;
Waltraud Herbst, Uttenreuth, DE;
Gertrud Falk, Erlangen, DE;
Eberhard Kühn, Hemhofen, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The invention relates to a process for amplifying structured resists. The process permits a subsequent increase in the etch resistance and a change in the structure size of the resist even in the case of ultrathin layers. The chemical amplification is carried out in a solvent that is so nonpolar that it does not dissolve the structured resist or dissolves it only to an insignificant extent. Because of the lower surface tension of these solvents, the danger of a collapse of these structures is additionally avoided.