The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Feb. 28, 2003
Siew Siew Yip, Erlangen, DE;
Jörg Rottstegge, Lilienthal, DE;
Ernst-christian Richter, Erlangen-Bruck, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Kerstin Seibold, Nürnberg, DE;
Marion Kern, Heroldsberg, DE;
Siew Siew Yip, Erlangen, DE;
Jörg Rottstegge, Lilienthal, DE;
Ernst-Christian Richter, Erlangen-Bruck, DE;
Gertrud Falk, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Kerstin Seibold, Nürnberg, DE;
Marion Kern, Heroldsberg, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A process for chemically amplifying structured resists includes applying a chemically amplified resist to a substrate and structuring it in a customary manner. Preferably, the amplification agent is applied in an aqueous phase to the structured resist and, after chemical amplification is complete, excess agent is removed by an aqueous wash medium. By using water as a solvent for the amplification agent and as a wash medium, it is possible to avoid organic solvents that constitute an explosion hazard. Furthermore, removal of partially exposed resist sections is suppressed.