Seoul, South Korea

Jung-In Park

This inventor holds 25 USPTO granted patents and 5 published patent applications, primarily in Maskless Exposure Technology. Top assignees: Samsung Display Co., Ltd., Samsung Electronics Co., Ltd., Az Electronic Materials (Korea) Ltd.. Active years: 2010-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-In Park. Retrieved from https://idiyas.com/inventor/jung-in-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 88.0

Average Co-Inventor Count = 5.9

ph-index = 2

Forward Citations = 26(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2013)
  • Suwon-si, KR (2010 - 2014)
  • Seoul, KR (2014 - 2018)

Company Filing History:


Years Active: 2010-2018

Loading Chart...
Areas of Expertise:
Maskless Exposure
Digital Exposure Device
Display Substrate
Photosensitive Resin
Photoresist Composition
Thin-Film Transistor
Alignment Apparatus
Exposing Apparatus
Organic Layer Composition
Stage Transferring Device
Manufacturing Method
Exposure System
25 patents (USPTO):Explore Patents

Title: Jung-In Park: Pioneering Inventor from Seoul

Introduction: Jung-In Park is a distinguished inventor hailing from Seoul, South Korea, known for his groundbreaking contributions to various technological fields.

Latest Patents: Jung-In Park holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his versatility and innovative spirit.

Career Highlights: With over two decades of experience in research and development, Jung-In Park has worked with leading tech companies and research institutions, consistently pushing the boundaries of innovation.

Collaborations: Throughout his career, Jung-In Park has collaborated with top scientists, engineers, and inventors globally, fostering a culture of creativity and excellence in his projects.

Conclusion: Jung-In Park's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and researchers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…