The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Mar. 20, 2015
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Sang-Hyun Lee, Suwon-si, KR;
Hyun-Seok Kim, Hwaseong-si, KR;
Jung-Chul Heo, Seoul, KR;
Hi-Kuk Lee, Yongin-si, KR;
Sang-Hyun Yun, Suwon-si, KR;
Ki-Beom Lee, Seoul, KR;
Chang-Hoon Kim, Asan-si, KR;
Jung-In Park, Seoul, KR;
Kab-Jong Seo, Seoul, KR;
Jun-Ho Sim, Suwon-si, KR;
Jae-Hyuk Chang, Seongnam-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.