The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Nov. 06, 2012
Applicant:

Samsung Display Co., Ltd., Yongin, KR;

Inventors:

Jung-In Park, Seoul, KR;

Cha-Dong Kim, Hwaseong-si, KR;

Su-Yeon Sim, Changwon-si, KR;

Sang-Hyun Yun, Suwon-si, KR;

Hi-Kuk Lee, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01J 1/00 (2013.01); G03F 7/20 (2013.01);
Abstract

An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.


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