The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Jun. 19, 2015
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Hyun-Seok Kim, Hwaseong-si, KR;
Sang-Hyun Yun, Suwon-si, KR;
Hi-Kuk Lee, Yongin-si, KR;
Jae-Hyuk Chang, Seongnam-si, KR;
Sang-Hyun Lee, Suwon-si, KR;
Jung-In Park, Seoul, KR;
Jung-Chul Heo, Seoul, KR;
Kab-Jong Seo, Seoul, KR;
Ki-Beom Lee, Seoul, KR;
Jun-Ho Sim, Suwon-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.